Optical element, having holographic material layer, display device, and method for manufacturing optical element

ABSTRACT

A deflection optical element, which diffracts incident light, includes a substrate having translucency, and a holographic material layer disposed so as to overlap the substrate, the holographic material layer being formed with a diffraction grating composed of interference fringes, wherein the holographic material layer is formed with an alignment mark where the interference fringes are discontinuous, and the alignment mark is located in an optically effective area where the holographic material layer diffracts the incident light.

The present application is based on, and claims priority from JPApplication Serial Number 2019-054812, filed Mar. 22, 2019, thedisclosure of which is hereby incorporated by reference herein in itsentirety.

BACKGROUND 1. Technical Field

The present disclosure relates to an optical element, a display device,and a method for manufacturing the optical element.

2. Related Art

In the related art, a technology for performing alignment of a pluralityof optical elements is known.

For example, an optical device of JP 2015-175967 A is produced with analignment mark being subjected to an interference exposure outside ofthe interference fringe formation region of the first hologramdiffraction grating and the second hologram diffraction grating. Thesealignment marks are then optically detected to make the first hologramdiffraction grating and the second hologram diffraction gratingrelatively aligned with each other.

Unfortunately, when the alignment mark is provided outside of theinterference fringe formation region as in JP 2015-175967 A, aholographic material is required which is larger than the opticallyeffective area used for diffraction of light, and the size of theexposure device for exposing the holographic material increases.

SUMMARY

An aspect for resolving the above-described issue is an optical elementdiffracting incident light, the optical element including a substratehaving translucency, and a holographic material layer disposed so as tooverlap the substrate, the holographic material layer being formed witha diffraction grating composed of interference fringes, wherein theholographic material layer is formed with a marking area where theinterference fringes are discontinuous, and the marking area is locatedin an optically effective area where the holographic material layerdiffracts the incident light.

In the above-described optical element, the marking area may be formedwith interference fringes that are discontinuous with the interferencefringes outside the marking area.

In the above-described optical element, the marking area may be formedwith no interference fringes.

The above-described optical element may have a surface layer havingtranslucency, in which the holographic material layer may be disposedbetween the substrate and the surface layer.

In the above-described optical element, in the holographic materiallayer, the optically effective area may be provided with a plurality ofthe marking areas.

Another aspect for resolving the above-described issue is a displaydevice including an image-light generating unit configured to generateimage light, and a light-guiding optical system configured to guide theimage light emitted from the image-light generating unit, in which thelight-guiding optical system includes the optical element according toany one of the aspect described above.

Another aspect for resolving the above-described issue is a method formanufacturing an optical element, by exposing an exposed member to forma diffraction grating composed of an interference fringes, the methodincluding disposing a marking member that makes the interference fringesdiscontinuous in at least one of an optical path of a reference lightwith which the exposed member is irradiated and an optical path of anobject light with which the exposed member is irradiated, and forming,in the exposed member, a marking area where the interference fringes arediscontinuous.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is an external perspective view illustrating an externalappearance of a display device.

FIG. 2 is an external perspective view illustrating an image-lightgenerating unit and a light-guiding optical system.

FIG. 3 is a view illustrating a configuration of a deflection opticalelement.

FIG. 4 is a view schematically illustrating a configuration of anexposure device.

FIG. 5 is an enlarged view of a main portion of an exposure device and aholographic material layer.

FIG. 6 is an enlarged view of a main portion of an exposure device and aholographic material layer.

FIG. 7 is a view of a deflection optical element viewed from a side of atransparent film layer.

FIG. 8 is an explanatory view illustrating a method for attaching adeflection optical element to a frame.

FIG. 9 is a flowchart illustrating a manufacturing process.

FIG. 10 is an enlarged view of a main portion of an exposure device anda holographic material layer.

DESCRIPTION OF EXEMPLARY EMBODIMENTS First Embodiment

FIG. 1 is an external perspective view illustrating an externalappearance of a display device 1 to which the present disclosure isapplied.

The display device 1 is a head-mounted display device. The displaydevice 1 includes an image-light generating unit 10 a for right eyehaving laser light as a light source, and a light-guiding optical system17 a for right eye configured to allow image light emitted from theimage-light generating unit 10 a for right eye to be guided to enter aright eye Ea of the user. The image-light generating unit 10 a and animage-light generating unit 10 b correspond to the “image-lightgenerating unit”. FIG. 1 illustrates a deflection optical element 13 aincluded in the light-guiding optical system 17 a. The display device 1also includes the image-light generating unit 10 b for left eye havinglaser light as a light source, and a light-guiding optical system 17 bfor left eye configured to allow image light emitted from theimage-light generating unit 10 b for left eye to be deflected to enter aleft eye Eb of the user. FIG. 1 illustrates a deflection optical element13 b included in the light-guiding optical system 17 b. Hereinafter,when the deflection optical element 13 a and the deflection opticalelement 13 b are collectively referred, these are described as“deflection optical element 13”. The deflection optical element 13corresponds to an example of the “optical element” of the presentdisclosure.

The display device 1, which is a head-mounted body having an eyeglassshape worn by the user on the head, includes a frame 15. The frame 15includes a temple 15 a on the right side, a temple 15 b on the leftside, and a front portion 15 c. The image-light generating unit 10 a isprovided on the temple 15 a on the right side, and the image-lightgenerating unit 10 b is provided on the temple 15 b on the left side.Further, the front portion 15 c of the frame 15 supports the deflectionoptical element 13 a and the deflection optical element 13 b.

FIG. 2 is a perspective view illustrating an external appearance of theimage-light generating unit 10 b and the light-guiding optical system 17b. The image-light generating unit 10 a and the light-guiding opticalsystem 17 a have the same configuration as the image-light generatingunit 10 b and the light-guiding optical system 17 b. Accordingly, theimage-light generating unit 10 b and the light-guiding optical system 17b will be described in the following description, and the description ofthe image-light generating unit 10 a and the light-guiding opticalsystem 17 a will be omitted.

The image-light generating unit 10 b includes a light source unit 110, adiffraction element 120, and a scanning optical system 130. Thelight-guiding optical system 17 b includes an optical system 140 and thedeflection optical element 13 b.

The light source unit 110 emits light source light to be modulated ormodulated light having been modulated. In the first embodiment, a casewhere the light source unit 110 emits modulated light having beenmodulated will be described. The light source unit 110 includes threelaser elements of a red laser element 111 configured to emit red light,a green laser element 112 configured to emit green light, and a bluelaser element 113 configured to emit blue light. The red laser element111, the green laser element 112, and the blue laser element 113 aresemiconductor lasers, and a non-illustrated controller controls theelements to irradiate a luminous flux modulated to the light intensitycorresponding to each of the dots of the image to be displayed.

The light source unit 110 also includes two half mirrors 115 and 117configured to synthesize the optical paths of the laser light emittedfrom the red laser element 111, the green laser element 112, and theblue laser element 113, and a collimating lens 119. The red light, greenlight, and blue light emitted from the collimating lens 119 are eachincident on the diffraction element 120.

The diffraction element 120 diffracts the incident colored light in apredetermined direction. The colored light diffracted by the diffractionelement 120 is incident on the scanning optical system 130. The scanningoptical system 130, which includes a scanning mirror 135, and causes thescanning mirror 135 to scan the luminous flux of the incident coloredlight to generate image light Lb. The scanning optical system 130 scansthe incident colored light in the first scanning direction A1 and in thesecond scanning direction A2 intersecting the first scanning directionA2 to generate the image light Lb. The scanning optical system 130 isachieved by a micromirror device formed by Micro Electro MechanicalSystems (MEMS) technology using, for example, a silicon substrate or thelike.

In the optical system 140, a relay lens system 141 provided with lenses141 a and 141 b and the like, a luminous flux diameter-expanding element143, a projection lens system 145, and the deflection optical element 13b are arranged in this order from the scanning optical system 130 towardthe deflection optical element 13 b. The luminous fluxdiameter-expanding element 143 expands the luminous flux emitted fromthe scanning optical system 130 to at least one of the first expansiondirection B1 corresponding to the first scanning direction A1 or thesecond expansion direction B2 corresponding to the second scanningdirection A2.

The projection lens system 145 projects the image light Lb expanded bythe luminous flux diameter-expanding element 143 onto the deflectionoptical element 13 b. The deflection optical element 13 b deflects theimage light Lb incident, in a first incident direction C1 correspondingto the first scanning direction A1 and a second incident direction C2corresponding to the second scanning direction A2. The image light Lbdeflected by the deflection optical element 13 b reaches the retinathrough the pupil of the left eye Eb to make the user recognize animage.

FIG. 3 is a cross-sectional view illustrating a configuration of thedeflection optical element 13 b.

The deflection optical element 13 b is a layered body including asubstrate 211, a holographic material layer 213, and a transparent filmlayer 215. The substrate 211 is a plastic substrate having translucencycomposed of PET, acrylic resin, or the like, for example. Theholographic material layer 213 is a layer of a volume holographicelement composed of a photopolymer material having a thickness ofapproximately from 5 to 50 μm. The transparent film layer 215, which isa protective layer for protecting the holographic material layer 213,has translucency. The transparent film layer 215 is constituted by atransparent film of polyethylene terephthalate (PET), polycarbonate(PC), polyamide (PA), triacetyl cellulose (TAC), or the like, forexample.

The holographic material layer 213 is formed with an interferencefringes thereinside and functions as a diffraction grating. Theholographic material layer 213 selectively diffracts, with theinterference fringes, light of a specific wavelength depending on theincident angle, and transmits light of the remaining wavelength.Accordingly, the external light incident on the deflection opticalelement 13 b is also incident on the left eye Eb via the deflectionoptical element 13 b. The user can recognize an image that the imagelight Lb formed by the display device 1 and the external light aresuperimposed on each other. In addition, the deflection optical element13 b, which forms a concave curved surface concaved to the opposite sideof the left eye Eb of the user, can efficiently cause the image light Lbto converge toward the left eye Eb of the user.

The image light Lb of red light, green light, and blue light is incidenton the holographic material layer 213, and the holographic materiallayer 213 diffracts the image light Lb incident, in a predetermineddirection to be emitted. The holographic material layer 213 may beconfigured such that interference fringes having a pitch correspondingto the wavelength of red light, interference fringes having a pitchcorresponding to the wavelength of green light, and interference fringeshaving a pitch corresponding to the wavelength of blue light are layeredin the thickness direction of the diffraction element.

The holographic material layer 213 also disperses photosensitivematerial having sensitivity corresponding to the respective wavelengthsof red light, green light, and blue light in the holographic materiallayer 213, and performs interference exposure on the holographicmaterial layer 213 using reference light SB and object light OB of therespective wavelengths. Thereby, interference fringes may be formed inone piece of the holographic material layer 213.

The interference fringes are a fringe pattern formed by separatingcoherent light emitted from a common light source into the object lightOB and the reference light SB, and irradiating the object light OB andthe reference light SB that are separated to the holographic materiallayer 213 to perform interference exposure. The interference fringes arerecorded in the holographic material layer 213 as a change in refractiveindex, a change in transmittance, and a change in shape of unevenpattern and the like.

FIG. 3 illustrates a state where interference fringes H are inclined inone direction with respect to the incident surface of the diffractiongrating formed in the holographic material layer 213. An incidence of alight ray F1 of a single wavelength from the normal direction of theholographic material layer 213 into the diffraction grating where theinterference fringes H illustrated in FIG. 3 is formed causesdiffraction light F2 having the highest diffraction efficiency to beemitted in one direction.

FIG. 4 is a view schematically illustrating the configuration of anexposure device 300. Further, FIGS. 5 and 6 are partially enlarged viewsenlarging portions of the exposure device 300 and an exposed member 219including the holographic material layer 213.

First, the exposed member 219 exposed by the exposure device 300 will bedescribed below.

The exposed member 219 is a member to which a holographic material film217 is attached to the substrate 211. The holographic material film 217includes the holographic material layer 213 where interference fringesare not yet formed, and the transparent film layer 215.

The exposure device 300 includes a laser light source 301 configured toemit laser light T to serve as exposure light, a shutter 302 configuredto switch passing and blocking of the laser light T, and a beam splitter303 configured to separate the laser light T into the object light OBand the reference light SB. A polarizing beam splitter may also be usedin place of the beam splitter 303. When using a polarizing beamsplitter, the intensity ratio of the reference light SB can be adjustedin combination with a half-wavelength plate.

The exposure device 300 also includes a first exposure optical system310 configured to irradiate the object light OB from one surface side ofthe exposed member 219, and a second exposure optical system 320configured to irradiate the reference light SB from the other surfaceside of the exposed member 219.

The first exposure optical system 310 includes a first mirror 311 thatcurves the optical path of the object light OB, a first objective lens312 that converges the object light OB, and a first collimator lens 313that renders the object light OB having been converged, into a parallelluminous flux. The first exposure optical system 310 irradiates theobject light OB substantially perpendicular with respect to one surfaceof the exposed member 219.

The second exposure optical system 320 includes a second mirror 321 thatcurves the optical path of the reference light SB, a second objectivelens 322 that converges the reference light SB, and a second collimatorlens 323 that renders the reference light SB having been converged, intoa parallel luminous flux. The second exposure optical system 320irradiates the reference light SB in an oblique direction with respectto the other surface of the exposed member 219.

The exposure device 300 having the above-described configuration causesthe object light OB and the reference light SB to be simultaneouslyirradiated from different directions to the exposed member 219. At thistime, interference fringes are formed in the holographic material layer213 by exposure light formed by interference of the object light OB withthe reference light SB.

Further, as illustrated in FIG. 5, marking members 240 a and 240 b aredisposed in the optical path of the object light OB emitted from thefirst collimator lens 313. The marking members 240 a and 240 b aredisposed in the optical path of the object light OB and at positionscorresponding to the positions at which alignment marks 230 a and 230 bof the exposed member 219 are to be formed. The alignment marks 230 aand 230 b are used as marks for alignment performed when attaching thedeflection optical element 13 b to the frame 15. The marking members 240a and 240 b are composed of a glass or a transparent plastic such asacrylic, for example. The marking members 240 a and 240 b may also becomposed of a transparent liquid, or a dielectric film or a dielectricmultilayer film that changes phase.

The marking members 240 a and 240 b have a function of making the wavefront of the object light OB discontinuous by means of a difference inrefractive index with the air. In the object light OB emitted from thefirst collimator lens 313, the object light OB passing through themarking members 240 a and 240 b differs in phase from the object lightOB not passing through the marking members 240 a and 240 b, and forms adiscontinuous phase.

The area of the holographic material layer 213 irradiated with theobject light OB passing through the marking members 240 a and 240 b isreferred to as marking area. The area of the holographic material layer213 irradiated with the object light OB not passing through the markingmembers 240 a and 240 b is referred to as non-marking area. Theinterference fringes formed in the marking area differ in phase from theinterference fringes formed in the non-marking area. That is, theinterference fringes formed in the marking area are discontinuousinterference fringes. Accordingly, the interference fringes formed inthe marking area can be distinguished from the interference fringesformed in the non-marking area, and the interference fringes formed inthe marking area can be used as the alignment marks 230 a and 230 b foralignment.

Further, as illustrated in FIG. 6, the marking members 240 a and 240 bmay be disposed in the optical path of the reference light SB. Themarking members 240 a and 240 b are disposed in the optical path of thereference light SB and at positions corresponding to the positions atwhich the alignment marks 230 a and 230 b of the exposed member 219 areto be formed.

FIG. 7 is a front view of the deflection optical element 13 b as viewedfrom the side of the transparent film layer 215.

The alignment marks 230 a and 230 b are formed within an opticallyeffective area 220 that causes the image light Lb incident on theholographic material layer 213 to be diffracted. Two marks of thealignment marks 230 a and 230 b are formed within the opticallyeffective area 220. Further, in the alignment marks 230 a and 230 b,interference fringes discontinuous in phase with the interferencefringes formed in other regions of the optically effective area 220 areformed.

The optically effective area 220 is an area where interference fringesare formed, or an area inside of the outer edge of the area where theinterference fringes are formed. In addition, the phrase that thealignment marks 230 a and 230 b, that is, the marking area is locatedwithin the optically effective area 220 encompasses that an area thatdoes not diffract image light in a desired direction is included withinthe optically effective area 220.

FIG. 8 is an explanatory view illustrating a method for attaching thedeflection optical element 13 b to the frame 15.

There are formed alignment marks 350 a and 350 b in the frame 15. Thealignment mark 350 a is formed on the side of the nose pads of the frame15, and the alignment mark 350 b is formed on the side of the temple 15b of the frame 15. The positions of the alignment marks 230 a and 230 bof the deflection optical element 13 b are adjusted to be aligned withthe positions of the alignment marks 350 a and 350 b with reference tothe positions of the alignment marks 350 a and 350 b of the frame 15.The deflection optical element 13 b is then attached to the frame 15.

FIG. 9 is a flowchart illustrating a manufacturing process of thedeflection optical element 13.

First, the holographic material film 217 is affixed to the substrate 211(Step S1), to produce the exposed member 219. The holographic materialfilm 217 is a film including the holographic material layer 213 and thetransparent film layer 215, and is in a state where no interferencefringes are formed in the holographic material layer 213. The surface onthe side on which the holographic material layer 213 of the holographicmaterial film 217 is provided is affixed to the substrate 211.

Next, the marking members 240 a and 240 b are disposed in the opticalpath of the object light OB emitted from the exposure device 300 and atpositions corresponding to the positions at which the alignment marks230 a and 230 b of the holographic material film 217 are to be formed(Step S2). At this time, it is advisable to ensure in advance that lightpassing through the marking members 240 a and 240 b does not adverselyaffect the optically effective area 220.

Next, the exposed member 219 is subjected to an interference exposure bythe exposure device 300 (Step S3), to form interference fringes in theholographic material film 217. The reference light SB and the objectlight OB are irradiated by the exposure device 300 to the holographicmaterial film 217 to generate interference fringes in the holographicmaterial film 217. At this time, properly selecting the wavelengths ofthe object light OB and the reference light SB allows interferencefringes having a desired pitch and a desired tilt angle to be formed inthe holographic material film 217. Further, the holographic materialfilm 217 where the interference fringes are formed may be subjected to atreatment such as ultraviolet irradiation, visible light irradiation,heat treatment, or the like. This allows the interference fringes formedin the holographic material film 217 to be fixed, thus decolorizing theholographic material layer 213. This results in a formation of thedeflection optical element 13 including the holographic material layer213 where interference fringes are formed.

Further, the interference exposure performed by the exposure device 300leads to a formation of the alignment marks 230 a and 230 b in theholographic material layer 213. The alignment marks 230 a and 230 b areformed within the optically effective area 220 that causes the imagelight Lb incident on the holographic material layer 213 to bediffracted, and interference fringes are formed, which are discontinuousin phase with the interference fringes formed in other regions of theoptically effective area 220.

Next, the deflection optical element 13 is affixed to the frame 15 wherethe alignment marks 350 a and 350 b are formed, with the deflectionoptical element 13 being aligned with the alignment marks 350 a and 350b (Step S4). At this time, an alignment is performed such that thepositions of the alignment marks 350 a and 350 b formed in the frame 15coincide with the positions of the alignment marks 230 a and 230 bformed in the deflection optical element 13, to thus affix thedeflection optical element 13 to the frame 15.

As described above, the display device 1 according to the firstembodiment includes the image-light generating unit 10 a and theimage-light generating unit 10 b, and the light-guiding optical systems17 a and 17 b configured to guide the image light L emitted from theimage-light generating unit 10 a and the image-light generating unit 10b. The light-guiding optical systems 17 a and 17 b include thedeflection optical elements 13 a and 13 b, respectively.

The deflection optical element 13 is an optical element including thesubstrate 211 having translucency, and the holographic material layer213 disposed on the substrate 211 in an overlapping manner, where in theholographic material layer 213, a diffraction grating composed ofinterference fringes is formed. The deflection optical element 13diffracts incident light.

The alignment marks 230 a and 230 b equivalent of a marking area whereinterference fringes are discontinuous are formed in the holographicmaterial layer 213. The alignment marks 230 a and 230 b are locatedwithin the optically effective area 220 that causes the holographicmaterial layer 213 to diffract incident light.

Accordingly, because the alignment marks 230 a and 230 b where theinterference fringes are discontinuous are formed within the opticallyeffective area 220, the alignment performed when the deflection opticalelement 13 is affixed to the frame 15 or the like can be done with highaccuracy, for example. Further, because it is unnecessary to forminterference fringes outside of the optically effective area 220, apreparation of a holographic material larger than the opticallyeffective area used for diffraction of light becomes unnecessary, makingit possible to suppress increase in size of the exposure device thatexposes the holographic material.

Further, in the alignment marks 230 a and 230 b, interference fringesdiscontinuous with the interference fringes formed in the areas otherthan the alignment marks 230 a and 230 b are formed.

Accordingly, within the optically effective area 220, the alignmentperformed when attaching the deflection optical element 13 to a membersuch as the frame 15 with accentuating the alignment marks 230 a and 230b can be more facilitated.

In addition, the transparent film layer 215 that is a surface layerhaving translucency is provided, and the holographic material layer 213is disposed between the substrate 211 and the transparent film layer215.

This allows the transparent film layer 215 to protect the holographicmaterial layer 213, and allows light to be incident on the holographicmaterial layer 213, causing the holographic material layer 213 todiffract the incident light.

Further, in the holographic material layer 213, a plurality of thealignment marks 230 a and 230 b are formed in the optically effectivearea 220.

This allows the alignment performed when affixing the deflection opticalelement 13 to a member such as the frame 15 to be more facilitated.

Further, the method for manufacturing an optical element is amanufacturing method in which coherent light is separated into theobject light OB and the reference light SB to irradiate the object lightOB and the reference light SB to the exposed member 219 including theholographic material film 217. A diffraction grating composed ofinterference fringes is formed in the holographic material film 217irradiated with the object light OB and the reference light SB.

In the manufacturing method, the marking members 240 a and 240 b thatmakes interference fringes discontinuous is disposed in the optical pathof the object light OB irradiated to the exposed member 219. Then, thealignment marks 230 a and 230 b where interference fringes arediscontinuous are formed in the exposed member.

This allows the alignment marks 230 a and 230 b where interferencefringes are discontinuous to be formed within the optically effectivearea 220 where the interference fringes are formed.

Second Embodiment

The second embodiment of the present disclosure will now be describedbelow with reference to FIG. 10. FIG. 10 is a partially enlarged view ofthe exposure device 300 and the holographic material layer 213.

In the second embodiment, a half-wavelength plate, a quarter-wavelengthplate, a liquid crystal, or the like is disposed, as the marking members240 a and 240 b, in the optical path of the object light OB and atpositions corresponding to the positions at which the alignment marks230 a and 230 b are to be formed. Further, as illustrated in FIG. 10,marking members 250 a and 250 b such as a half-wavelength plate, aquarter-wavelength plate, a liquid crystal, or the like are alsodisposed in the optical path of the reference light SB and at positionscorresponding to the positions at which the alignment marks 230 a and230 b are to be formed.

This makes it possible to align the polarization of the object light OBand the reference light SB irradiated to the positions at which thealignment marks 230 a and 230 b are to be formed, and to form thealignment marks 230 a and 230 b at the positions at which the alignmentmarks 230 a and 230 b are to be formed. Further, using a half-wavelengthplate, a quarter-wavelength plate, a liquid crystal, or the like for themarking members 240 a and 240 b and the marking members 250 a and 250 bcan adjust the amount of displacement in phase between the interferencefringes formed in the marking members 240 a and 240 b and theinterference fringes formed in other regions.

In addition, a light-shielding member that blocks the object light OBmay be used as the marking members 240 a and 240 b. Using thelight-shielding member for the marking members 240 a and 240 b does notcause interference fringes to be formed in the alignment marks 230 a and230 b. The alignment marks 230 a and 230 b, where no interferencefringes are formed, can be easily distinguished from other regions ofthe optically effective area 220, and can be used as a mark whenperforming an alignment process.

The above-described embodiments are preferred embodiments of the presentdisclosure. However, in the present disclosure, various modificationsare possible within the scope that does not depart from the gist of thepresent disclosure without being limited to the above-describedembodiments.

For example, while the above-described embodiments have been describedby way of examples in which a reflection-type hologram is produced, thepresent disclosure can also be applied to cases where atransmission-type hologram is produced.

Further, the reference light SB and the object light OB may be planarwaves or spherical waves. In addition, one of the reference light SB orthe object light OB may be planar waves, and the other may be sphericalwaves.

Further, although FIG. 2 illustrates an example in which the holographicmaterial layer 213 and the transparent film layer 215 of the deflectionoptical element 13 b are disposed on the side of the left eye Eb, thedeflection optical element 13 b may be disposed to cause the substrate211 to be disposed on the side of the left eye Eb. That is, thesubstrate 211, the holographic material layer 213, and the transparentfilm layer 215 may be arranged in this order from the side of the lefteye Eb.

Further, as the light source provided in the image-light generating unit10 a and the image-light generating unit 10 b, an organicelectroluminescence element (OLED: Organic Light Emitting Diode), and aself-luminous element such as a micro LED array, quantum-dot lightemitting element (QLED: quantum-dot light emitting diode) may be used.In addition, the image-light generating units 10 a and 10 b may beconfigured by a light-emitting diode and a liquid crystal panel thatmodulates light emitted from the light-emitting diode.

What is claimed is:
 1. An optical element diffracting incident light,the optical element comprising: a substrate having translucency; and aholographic material layer disposed so as to overlap the substrate, theholographic material layer including a non-marking area that hasinterference fringes and a marking area that has interference fringesand that is surrounded by the non-marking area, wherein the interferencefringes of the marking area are discontinuous to the interferencefringes of the non-marking area, and the marking area and thenon-marking area are located in an area where the holographic materiallayer diffracts the incident light.
 2. The optical element according toclaim 1, comprising a surface layer having translucency, wherein theholographic material layer is disposed between the substrate and thesurface layer.
 3. The optical element according to claim 1, wherein theholographic material layer is provided with a plurality of the markingareas.
 4. A display device comprising: an image-light generating unitconfigured to generate image light; and a light-guiding optical systemconfigured to guide the image light emitted from the image-lightgenerating unit, wherein the light-guiding optical system includes theoptical element according to claim
 1. 5. A method for manufacturing anoptical element, by exposing an exposed member to form a diffractiongrating composed of interference fringes, the method comprising:disposing a marking member, that makes the interference fringesdiscontinuous, in at least one of an optical path of a reference lightwith which the exposed member is irradiated and an optical path of anobject light with which the exposed member is irradiated; and forming,in the exposed member, a non-marking area that has the interferencefringes and a marking area that has the interference fringes and that issurrounded by the non-marking area, wherein the interference fringes ofthe marking area are discontinuous to the interference fringes of thenon-marking area.